Plasma Surface Engineering Research and its Practical Applications (1st ed.). "Fundamentals and applications of HIPIMS" (PDF). "Influence of high power densities on the composition of pulsed magnetron plasmas". Recently, innovative applications of HIPIMS coated surfaces for biomedical applications were reported by Rtimi et al. The desirable condition is high hardness with a relatively small Young's modulus, such as can be found in HIPIMS coatings. The ratio between hardness and Young's modulus is a measure of the toughness properties of the coating. Whereas comparable conventional nano-structured (Ti,Al)N coatings have a hardness of 25 GPa and a Young's modulus of 460 GPa, the hardness of the new HIPIMS coating is higher than 30 GPa with a Young's modulus of 368 GPa. The main advantages of HIPIMS coatings include a denser coating morphology and an increased ratio of hardness to Young's modulus compared to conventional PVD coatings. The gold version of the Apple iPhone 12 Pro uses this process on the structural stainless steel band that also serves as the device's antenna system. The first HIPIMS coating units appeared on the market in 2006. HIPIMS has been successfully applied for the deposition of thin films in industry, particularly on cutting tools. Hard Coatings: carbon nitride CN x, Ti–C nanocomposite.Optical: Ag, TiO 2, ZnO, InSnO, ZrO 2, CuInGaSe.Oxidation Resistant: CrAlYN/CrN nanoscale multilayer, Ti-Al-Si-N, Cr-Al-Si-N nanocomposite.Corrosion Resistant: CrN/ NbN nanoscale multilayer.The following materials have, among others, been deposited successfully by HIPIMS: Significant overviews of reactive HiPIMS were published by A. However, as it is characteristic of these methods, the performance of such depositions has significant hysteresis and need to be carefully examined to inspect the optimal operation points. Similarly to what is witnessed in conventional reactive sputter deposition process, HiPIMS has also been used to attain oxide or nitride-based films on several substrates, as is seen in the list below. The commercialisation of HIPIMS hardware that followed made the technology accessible to the wider scientific community and triggered developments in a number of areas. The films had a high hardness, good corrosion resistance and low sliding wear coefficient. The first thorough investigation of films deposited by HIPIMS by TEM demonstrated a dense microstructure, free of large scale defects. Transition metal nitride (CrN) thin films were deposited by HIPIMS for the first time in February 2001 by A.P. Kouznetsov for the application of filling 1 µm vias with aspect ratio of 1:1.2 The deposition of copper films by HIPIMS was reported for the first time by V. HIPIMS utilises extremely high power densities of the order of kW⋅cm −2 in short pulses (impulses) of tens of microseconds at low duty cycle (on/off time ratio) of 0.5 A⋅cm −2 have a dense columnar structure with no voids. High-power impulse magnetron sputtering (HIPIMS or HiPIMS, also known as high-power pulsed magnetron sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition.
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